MANUFACTURING METHOD FOR ELECTRON SOURCE AND IMAGE FORMING APPARATUS USING THE ELECTRON SOURCE

Title:

MANUFACTURING METHOD FOR ELECTRON SOURCE AND IMAGE FORMING APPARATUS USING THE ELECTRON SOURCE

Document Type and Number:

Japanese Patent JP3884980

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a manufacturing method for an electron source having excellent electron emission characteristics and having electron emission characteristic having high uniformity and an image forming apparatus by reducing the time required for a manufacturing process for the electron source having a plurality of surface conductive type electron emitting elements.
SOLUTION: This manufacturing method for an electron source at least includes a process of disposing a plurality of units respectively composed of a pair of electrodes and a high polymer film disposed to connect the pair of electrodes and wires electrically connected to the plurality of units on a substrate, a process of selectively spot-radiating an energy beam to the high polymer films of one or more units contained in a designated area, scanning and radiating the energy beam two or more times while moving the position of the spot irradiation to thereby supply divided energy to each high polymer film two or more times and lower the resistance of the high polymer film, and a process of forming a gap in the film where the resistance of the high polymer film is lowered.

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Inventors:

Akira Shimazu
Mizuno Yunobu

Application Number:

JP2002054341A

Publication Date:

February 21, 2007

Filing Date:

February 28, 2002

Export Citation:

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