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Title:
ガスバリアフィルムの製造方法、ガスバリアフィルム及び有機光電変換素子
Document Type and Number:
Japanese Patent JP5691175
Kind Code:
B2
Abstract:

To provide a method for stably manufacturing a gas barrier film having high gas barrier properties without causing irregularity by improving coating properties and adhesion at the time when a coating type barrier layer is formed on a base material or film containing an organic resin component, the gas barrier film, and an organic photoelectric conversion element having the gas barrier film.

In the method for manufacturing the gas barrier film by forming at least one gas barrier layer on the base material or film containing the organic resin component by coating the surface of the base material or film with a silicon compound-containing solution, a process for performing coating property enhancing treatment with respect to the surface of the base material or film containing the organic resin component is provided before the surface of the base material or film is coated with the silicon compound-containing solution and, before the coating property enhancing treatment, simultaneously with the coating property enhancing treatment or after the coating property enhancing treatment, the base material or film is heated.

COPYRIGHT: (C)2011,JPO&INPIT


Inventors:
Chiyoko Takemura
Application Number:
JP2010004751A
Publication Date:
April 01, 2015
Filing Date:
January 13, 2010
Export Citation:
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Assignee:
Konica Minolta Co., Ltd.
International Classes:
B32B9/00; C08J7/04; H01L51/42; H01L51/50; H05B33/04; H05B33/10
Domestic Patent References:
JP2009255040A
JP2001111076A
JP2004316319A
JP6330467A
JP2006274199A
JP2007301878A
JP2008107499A
JP2009259570A
JP5140355A
JP2007305318A
JP2007237588A
Foreign References:
WO2006075490A1
Attorney, Agent or Firm:
Hatta International Patent Corporation