Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MANUFACTURING METHOD OF GLASS SUBSTRATE FOR MASK BLANKS, AND MANUFACTURING METHOD OF MASK BLANK
Document Type and Number:
Japanese Patent JP2004291209
Kind Code:
A
Abstract:

To keep flatness of a glass substrate surface, to remedy roughness of the glass substrate surface, and to remove defect on the glass substrate surface, in a polishing process of polishing the locally-worked glass substrate surface for remedying the roughness by the local working and removing the defect.

This manufacturing method of a glass substrate for mask blanks comprises: an uneven shape measuring process of measuring unevenness on the glass substrate surface; a flatness controlling process of controlling the flatness on the glass substrate surface to a predetermined reference value or lower by applying the local working based on the measured result obtained in the uneven shape measuring process; and a non-contact polishing process of polishing the glass substrate surface applied with the local working, by an action of the working fluid interposed between the glass substrate surface and a tool surface for polishing, and without contacting with the tool surface for polishing, after the flatness controlling process.


Inventors:
KOIKE KESAHIRO
Application Number:
JP2003090682A
Publication Date:
October 21, 2004
Filing Date:
March 28, 2003
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HOYA CORP
International Classes:
B24B37/00; B24B49/04; C03C19/00; G03F1/24; G03F1/60; G03F1/68; H01L21/027; (IPC1-7): B24B37/00; B24B49/04; G03F1/08; G03F1/14; H01L21/027
Attorney, Agent or Firm:
Kihei Watanabe