To provide a manufacturing method of a laminate having a patterned metal film capable of easily performing plasma etching treatment of a plated layer and obtaining a laminate excellent in insulation properties between patterned metal films.
A manufacturing method of a laminate having a patterned metal film 16 comprises: a plated layer formation step of forming a plated layer 12 on a substrate using a composition for forming a plated layer containing a binary copolymer composed of prescribed units; a catalyst imparting step of imparting a plating catalyst or its precursor to the plated layer; a step of forming a metal film 14 on the plated layer by performing plating treatment; a pattern formation step of forming a patterned metal film using an etching liquid; an acid solution contact step of bringing a substrate having the patterned metal film into contact with an acid solution; and a plated layer removal step of removing the plated layer 12 of a region 30 in which the patterned metal film is not formed by performing plasma etching treatment.
UEKI YUKITAKA
HAMA IFUMI
Haruko Sanwa
Hideaki Ito
Fumio Mitsuhashi