Title:
MANUFACTURING METHOD OF LITHOGRAPHY ORIGINAL AND MANUFACTURING METHOD OF INTEGRATED CIRCUIT
Document Type and Number:
Japanese Patent JP2012068450
Kind Code:
A
Abstract:
To provide a manufacturing method of a lithography original which can contribute to improvement in yield.
In a manufacturing method of a lithography original, a continuous pattern of periodic patterns 4 which appear on a circuit pattern 3 is formed over the substantially whole area of a substrate, and defect inspection is performed to detect defects in the continuous pattern. The arrangement of a formation area of the circuit pattern is determined avoiding a detected defect to remove a continuous pattern formed outside the formation area of the circuit pattern.
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Inventors:
TAKIMOTO MICHIYA
Application Number:
JP2010213457A
Publication Date:
April 05, 2012
Filing Date:
September 24, 2010
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
G03F1/68
Attorney, Agent or Firm:
Hiroaki Sakai