Title:
METHOD FOR PRODUCING MASK AND MASK
Document Type and Number:
Japanese Patent JP2023001889
Kind Code:
A
Abstract:
To provide a method for producing a mask that can reduce capital investment for producing enlarged masks.SOLUTION: A method for producing a mask may include an intermediate part forming step for forming an outer edge of an intermediate part 52 and a through-hole group on a substrate, a first end forming step for forming an outer edge of a first end on the substrate, and a second end forming step for forming an outer edge of a second end on the substrate. The intermediate part forming step may include a procedure for exposing a resist layer 62 on the substrate using a first exposure mask and a procedure for etching the substrate through the exposed and developed resist layer. The first end forming step may include a procedure for exposing the resist layer on the substrate using a second exposure mask and a procedure for etching the substrate through the exposed and developed resist layer. The first end forming step may also include a procedure for processing the substrate using laser.SELECTED DRAWING: Figure 10A
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Inventors:
TANAKA SHIGEMI
IKENAGA CHIKAO
IKENAGA CHIKAO
Application Number:
JP2022094348A
Publication Date:
January 06, 2023
Filing Date:
June 10, 2022
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
C23C14/04; H05B33/10; H10K50/00
Attorney, Agent or Firm:
Miyajima Manabu
Yukihiro Hotta
Kazuo Okamura
Yukihiro Hotta
Kazuo Okamura
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