Title:
MANUFACTURING METHOD OF MICROSTRUCTURE USING PREFORMED PHOTORESIST SHEET
Document Type and Number:
Japanese Patent JP2001293700
Kind Code:
A
Abstract:
To provide a manufacturing method of such a microstructure as is made of metal and a photoresist used in the method.
A forming method of a microstructure includes (a) a step that a preforming sheet of a photoresist material capable of having a sensitivity against a developer by exposing with a radiation; (b) a step that the photoresist sheet is exposed at a pattern by a radiation varying a sensitivity of the photoresist sheet against the developer; (c) a step that the photoresist sheet material is mechanically removed to reduce a thickness of the sheet to a predetermined thickness; and (d) a step that the developer is applied to the exposed photoresist to remove a photoresist part sensitive to the developer.
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Inventors:
GUCKEL HENRY
CHRISTENSON TODD R
SKROBIS KENNETH
CHRISTENSON TODD R
SKROBIS KENNETH
Application Number:
JP2001047829A
Publication Date:
October 23, 2001
Filing Date:
December 07, 1993
Export Citation:
Assignee:
WISCONSIN ALUMNI RES FOUND
International Classes:
B81B1/00; B81C1/00; G03F7/027; G03F7/00; G03F7/20; G03F7/26; G03F7/30; G03F7/38; G03F7/40; H01L21/027; H05K3/18; (IPC1-7): B81C1/00; G03F7/40
Attorney, Agent or Firm:
Minoru Nakamura (7 outside)