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Title:
多層グラフェン被覆基板の製造方法
Document Type and Number:
Japanese Patent JP5728031
Kind Code:
B2
Abstract:
The present invention provides a method of producing a multi-layer graphene-laminated substrate which comprises laminating, on a substrate surface, multi-layer graphenes from a mass of multi-layer graphenes. The method of the present invention can provide an electrically conductive film and a transparent electrically conductive film made of graphenes more easily and stably.

Inventors:
Issei Muramatsu
Application Number:
JP2012556867A
Publication Date:
June 03, 2015
Filing Date:
February 06, 2012
Export Citation:
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Assignee:
Incubation Alliance Co., Ltd.
International Classes:
C01B31/02; B32B18/00; H01B5/14; H01B13/00
Foreign References:
WO2010110153A12010-09-30
WO2009089268A22009-07-16
US20080248275A12008-10-09
WO2010128650A22010-11-11
WO2010137592A12010-12-02
Other References:
JPN6012019998; Xiaogan LIANG,et al.: 'Graphene Transistors Fabricated via Transfer-Printing In Device Active-Areas on Large Wafer' Nano Letters Vol.7 No.12, 2007, Page.3840-3844
Attorney, Agent or Firm:
Asahina Patent Office
Kawamura Taku
Yousuke Fujimori
Keiko Kato
Masahiro Mishima