Title:
ナノ・マイクロ突起体の製造方法
Document Type and Number:
Japanese Patent JP5924515
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a new nano/micro projection body that is expected to be applied to a catalyst and various electronic purposes, and to provide a method for producing the projection body.SOLUTION: The nano/micro projection body is formed and grown, on a plate made of a noble metal having threshold energy of Ar ion sputtering of 25 eV or less and having activation energy of surface diffusion of 1.6 eV or less, by irradiating the plate with a high energy beam in low vacuum to induce surface diffusion of sputtered metal atoms in a direction toward the energy source. The method for producing a nano/micro projection body comprises irradiating a plate made of a noble metal having threshold energy of Ar ion sputtering of 25 eV or less and activation energy of surface diffusion of 1.6 eV or less, with a high energy beam in low vacuum to induce surface diffusion of metal atoms in a direction toward the energy source, and thereby integrating a plurality of small projection bodies to form a large projection body.
Inventors:
Shunichiro Tanaka
Masaki Chiba
Masaki Chiba
Application Number:
JP2011091972A
Publication Date:
May 25, 2016
Filing Date:
April 18, 2011
Export Citation:
Assignee:
Tohoku University
International Classes:
B82B1/00; B82B3/00; B82Y30/00; B82Y40/00; H01J1/304; H01J9/02
Domestic Patent References:
| JP2005262373A | ||||
| JP2008094686A | ||||
| JP2011056638A |
Other References:
Shogo Oda, et al.,"Preferred Orientation of Cu2O Nano-/Micro-Protrusions Grown by Ar Ion Irradiation",Materials Science Forum,2010年,Vols.638-642,pp 1784-1789
Hiroyuki TANAKA, et al.,"Growth of Cu-oxide Protrusion by Ar Ion Irradiation",Materials Science Forum,2007年,vols.558-559,pp 1359-1362
Hiroyuki TANAKA, et al.,"Growth of Cu-oxide Protrusion by Ar Ion Irradiation",Materials Science Forum,2007年,vols.558-559,pp 1359-1362
Attorney, Agent or Firm:
Atsushi Suda