Title:
光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
Document Type and Number:
Japanese Patent JP4770090
Kind Code:
B2
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| WO/2022/008155 | MIRROR FOR A LITHOGRAPHY SYSTEM |
Inventors:
Yuichi Shibasaki
Application Number:
JP2001248321A
Publication Date:
September 07, 2011
Filing Date:
August 17, 2001
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G02B7/00; G02B7/02; G03F7/20; H01L21/027
Domestic Patent References:
| JP11231192A | ||||
| JP10232363A |
Foreign References:
| EP1028342A1 |
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda