Title:
液晶表示装置製造用多階調フォトマスク、液晶表示装置製造用多階調フォトマスクの製造方法及びパターン転写方法
Document Type and Number:
Japanese Patent JP5319193
Kind Code:
B2
Abstract:
PURPOSE: A multi-gray scale photomask and a pattern transfer method are provided to obtain light density distribution including a flat region by increasing the transmissivity between a light-shielding layer and a half transmissive film. CONSTITUTION: A half transmissive film and a light-shielding layer are formed on a transparent substrate. The light shielding portion(2), a light-transmitting portion(4), and a half light-transmitting portion(3) are formed by light-shielding layer pattern and the half transmissive film. The half light-transmitting portion is located between two separated light shielding portions. The half light-transmitting portion is interposed between two light shielding portions and a first half transmissive film. The width of the half light-transmitting portion inserted between the light shielding portion is 3um~6um.
Inventors:
Koichiro Yoshida
Application Number:
JP2008194187A
Publication Date:
October 16, 2013
Filing Date:
July 28, 2008
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/28; G02F1/1368; G03F1/58; H01L21/336; H01L29/786
Domestic Patent References:
| JP2002196474A | ||||
| JP2008065139A | ||||
| JP2006268035A | ||||
| JP2007249198A | ||||
| JP2008046623A | ||||
| JP2008180897A | ||||
| JP2010026205A |
Attorney, Agent or Firm:
Hiroyoshi Aoki
Amada Masayuki
Amada Masayuki