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Title:
MANUFACTURING METHOD FOR POROUS PLATE AND PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2021126750
Kind Code:
A
Abstract:
To suppress adhesion of liquid in a surface to be held of a work-piece, without arranging an additional air blow unit in a processing device.SOLUTION: A manufacturing method for a porous plate that is used in a chuck table comprises the steps of: preparing a mixture of a plurality of abrasive grain, a bond material that is melted by being heated and then is cooled to fix the plurality of abrasive grain and a gas cavity formation material whose average particle size is 50 μm or more and which disperses by being heated; molding the mixture to form a plate-like molded product; and calcinating the molded product to form a porous plate. The porous plate has the gas cavity formed by the dispersing of the gas cavity formation material and a gap between the abrasive grain and the bond material, which is different from the gas cavity. The gas cavity is communicated with the gap and the gas cavity rises on one surface of the porous plate. When liquid is supplied to the one surface, the liquid is suctioned into the gas cavity and then exhausted through the gas cavity into the gap by capillarity.SELECTED DRAWING: Figure 7

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Inventors:
HANASHIMA SATOSHI
UMAJI RYOGO
Application Number:
JP2020024323A
Publication Date:
September 02, 2021
Filing Date:
February 17, 2020
Export Citation:
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Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
B23Q3/08; B24B41/06; B24B55/06; H01L21/301; H01L21/304; H01L21/683
Attorney, Agent or Firm:
Akira Matsumoto
Tomohiro Okamoto
Kasahara Takahiro
Ei Okamoto
Takayuki Okano