Title:
静電誘導装置用基板の製造方法及び静電誘導装置用基板
Document Type and Number:
Japanese Patent JP6839573
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing step of a substrate for a static induction device having an electret film with the improved surface potential by increasing thickness of a silicon oxide film.SOLUTION: Disclosed is a method of manufacturing an electret film made of a silicon oxide film. This method includes: a step of forming a groove 3 and a protrusion 2 in a silicon substrate 1; a thermal oxidation step of converting all the protrusions to a silicon oxide film D by heating treatment; and a charging step of charging the silicon oxide film D. Furthermore, by including a step of removing the silicon oxide film D in the thickness direction and partially exposing the silicon substrate 1, electret films divided from each other are formed on the surface of the silicon substrate.SELECTED DRAWING: Figure 1
Inventors:
Tomoo Ikeda
Application Number:
JP2017048450A
Publication Date:
March 10, 2021
Filing Date:
March 14, 2017
Export Citation:
Assignee:
CITIZEN WATCH CO.,LTD.
International Classes:
H01G7/02; B81C1/00; H02N1/00
Domestic Patent References:
| JP2014107890A | ||||
| JP2004303744A | ||||
| JP2015138930A | ||||
| JP2004342774A |
Attorney, Agent or Firm:
Akira Miyajima