Title:
MANUFACTURING METHOD OF SUBSTRATE FOR FILTER, INK JET RECORDING HEAD AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2006126116
Kind Code:
A
Abstract:
To provide a filter enabling separation and filtration even to a finer foreign substrate in a passage.
The first mask 102 comprising a resist heated higher than a glass transition point and the second mask 103 comprising a resist not subjected to such heat treatment are formed on a silicon substrate 101, and dry etching is applied thereto. Hereby, a groove part 104 and a wall 105 having a hole 106 formed in the groove part 104 are formed simultaneously on the substrate 101. In this case, silicon under a wider part of the first mask 102 is used as a wall part for partitioning the hole 106.
Inventors:
KATO MASATAKA
TERUI MAKOTO
KANRI RYOJI
TERUI MAKOTO
KANRI RYOJI
Application Number:
JP2004317801A
Publication Date:
May 18, 2006
Filing Date:
November 01, 2004
Export Citation:
Assignee:
CANON KK
International Classes:
G01N37/00; B41J2/16
Attorney, Agent or Firm:
Akio Miyazaki
Ishibashi Masayuki
Shinichi Iwata
Masaaki Ogata
Ishibashi Masayuki
Shinichi Iwata
Masaaki Ogata
Previous Patent: DEVICE FOR MEASURING PARTICLE SIZE
Next Patent: UNDERGROUND SURVEY METHOD AND UNDERGROUND SURVEY INSTRUMENT
Next Patent: UNDERGROUND SURVEY METHOD AND UNDERGROUND SURVEY INSTRUMENT