Title:
MANUFACTURING METHOD OF SUBSTRATE FOR IMAGE MATERIAL, AND SUBSTRATE FOR IMAGE MATERIAL
Document Type and Number:
Japanese Patent JP2005118615
Kind Code:
A
Abstract:
To provide a manufacturing method of a substrate for an image material by which a coating liquid can uniformly applied on an image forming layer side.
In the manufacturing method of the substrate by which the coating liquid is applied on the sheet like substrate by an offset gravure coater, the hardness of an offset roll of the offset gravure coater in a type A durometer of the ISO 7619 regulation is within the range of A35-80.
Inventors:
YAMANE KENGO
NAKAMURA MUNETOMO
YASUHARA MASARU
NAKAMURA MUNETOMO
YASUHARA MASARU
Application Number:
JP2003353140A
Publication Date:
May 12, 2005
Filing Date:
October 14, 2003
Export Citation:
Assignee:
MITSUBISHI PAPER MILLS LTD
International Classes:
G03C1/74; B05D1/28; B05D7/00; B41M5/00; B41M5/382; B41M5/40; B41M5/50; B41M5/52; D21H23/56; D21H27/00; G03C1/79; G03C1/91; (IPC1-7): B05D1/28; B05D7/00; B41M5/00; B41M5/40; D21H23/56; D21H27/00; G03C1/74; G03C1/79; G03C1/91
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