Title:
蒸着マスクの製造方法、蒸着マスク装置の製造方法および蒸着マスクの良否判定方法
Document Type and Number:
Japanese Patent JP6376483
Kind Code:
B2
Abstract:
When a dimension from a point P1 to a point Q1 is X1, a dimension from a point P2 to a point Q2 is X2, and a predetermined value is αx, a deposition mask satisfies the following.αX−X1+X22≤40μmandX1−X2≤60μm
Inventors:
Ike Nagachikao
Application Number:
JP2017238092A
Publication Date:
August 22, 2018
Filing Date:
December 12, 2017
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| JP2014148743A | ||||
| JP2016053192A |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Kazuya Yamashita
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Yukihiro Hotta
Kazuya Yamashita