Title:
マスクブランク検査方法、反射型露光マスクの製造方法、反射型露光方法および半導体集積回路の製造方法
Document Type and Number:
Japanese Patent JP5039495
Kind Code:
B2
Abstract:
The mask blank inspection apparatus is constituted of a stage for mounting a reflective mask blank thereon, a light source for generating inspection light, a mirror serving as an illuminating optics, an imaging optical system, a beam splitter, two two-dimensional array sensors, signal storage units, an image processing unit, a main control unit for controlling operation of the whole apparatus, the first sensor being located at a position which is displaced by a predetermined distance from the focal plane of a first light beam, the second sensor being located at a position which is displaced by a predetermined distance from the focal plane of a second light beam along a opposite direction, whereby accurately and conveniently inspecting presence/absence and types of defects in reflective mask blank.
Inventors:
Tsuneo Terazawa
Toshihiko Tanaka
Tatsuya Aota
Toshihiko Tanaka
Tatsuya Aota
Application Number:
JP2007260796A
Publication Date:
October 03, 2012
Filing Date:
October 04, 2007
Export Citation:
Assignee:
Renesas Electronics Corporation
International Classes:
G01N21/956; G03F1/22; G03F1/24; H01L21/027
Domestic Patent References:
| JP2007219130A | ||||
| JP2001235853A | ||||
| JP2007041600A | ||||
| JP2002181723A | ||||
| JP2005524827A | ||||
| JP2000241121A | ||||
| JP2001174291A | ||||
| JP2004193269A | ||||
| JP4328549A | ||||
| JP2006010599A | ||||
| JP2002286409A |
Attorney, Agent or Firm:
Takuji Yamada
Mitsuo Tanaka
Mikio Takeuchi
Mitsuo Tanaka
Mikio Takeuchi