Title:
MASK DESIGN EQUIPMENT AND DETERMINATION METHOD OF MASK APERTURE DIMENSION
Document Type and Number:
Japanese Patent JP2020126867
Kind Code:
A
Abstract:
To provide a mask design equipment and a determination method of mask aperture dimension capable of appropriately designing a mask used in screen printing, which has high printing difficulty, by efficiently determining the optimum printing conditions.SOLUTION: When determining the mask aperture dimension in mask design, the aperture dimension of the mask aperture formed on the mask is calculated based on the solder volume required for solder-bonding electrodes of the component to be bonded to the land of a substrate, and the acquired print difficulty is evaluated as to whether it is appropriate for printing by comparing the print difficulty obtained from this aperture dimension with the print difficulty limit value acquired for the solder paste used. With this, the optimum printing conditions are efficiently determined and the mask used in screen printing, which has high printing difficulty is appropriately designed.SELECTED DRAWING: Figure 8
Inventors:
OTAKE YUJI
MAEDA KEN
MAEDA KEN
Application Number:
JP2019016612A
Publication Date:
August 20, 2020
Filing Date:
February 01, 2019
Export Citation:
Assignee:
PANASONIC IP MAN CORP
International Classes:
H05K3/34; B41F15/08; B41F15/12; B41N1/24
Attorney, Agent or Firm:
Kenji Kamada
Koichi Nomura
Koichi Nomura