Title:
MASK DIMENSION MEASURING INSTRUMENT AND MEASURING METHOD USING THE INSTRUMENT
Document Type and Number:
Japanese Patent JP2001255130
Kind Code:
A
Abstract:
To provide a mask dimension measuring instrument, capable of measuring the dimension of the minute pattern or hole on a mask in a non destructive and non contact state with high accuracy and also capable of measuring a long dimension not entering a measuring visual field, and a measuring method using the same.
The mask dimension measuring instrument is equipped with a movable stage 3 for placing the mask 6 to be measured, measuring means 4, 7 for measuring the moving distance of the stage, an irradiation means for irradiating the mask to be measured with an electron beam and a measuring means for measuring the intensity of the secondary electrons or reflected electrons discharged from the mask to be measured.
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Inventors:
ITOU KOUJIROU
TAMURA AKIRA
KONISHI TOSHIO
SASAKI HIRONOBU
EGUCHI HIDEYUKI
TAMURA AKIRA
KONISHI TOSHIO
SASAKI HIRONOBU
EGUCHI HIDEYUKI
Application Number:
JP2000067065A
Publication Date:
September 21, 2001
Filing Date:
March 10, 2000
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G01B15/00; G03F1/84; G03F1/86; H01J37/20; H01J37/244; H01J37/28; (IPC1-7): G01B15/00; G03F1/08; H01J37/20; H01J37/244; H01J37/28
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