To enhance stiffness in an entire mask.

The mask comprises a membrane 17 in which an exposure pattern is formed for each of a plurality of prescribed regions, and a support beam 19 for supporting the membrane 17 for each prescribed region while the membrane 17 is surrounded. In a partial region in the plurality of prescribed regions of the membrane 17, the exposure pattern and a mask alignment mark 20 are formed. The region in which the exposure pattern and the mask alignment mark 20 are formed is set without providing a region exclusive for the mask alignment mark 20 surrounded by the support beam 19, thus reducing the area of the membrane 17 as compared with the region exclusive for the mask alignment mark 20.