Title:
MASK FOR EXPOSURE
Document Type and Number:
Japanese Patent JP2000066375
Kind Code:
A
Abstract:
To obtain a mask for exposure not causing image defects due to rubbing.
The mask for exposure has physical developing nuclei on the transparent substrate, forms a circuit pattern using a silver film obtd. by dissolving a silver halide and receiving an image by the physical developing nuclei in development as a light shielding film and has a protective coat contg. at least a metal oxide component on the light shielding film. The protective coat may comprise colloidal silica, a metallic org. compd. or a colloidal silica-acrylic resin composite.
Inventors:
TAKAOKA KAZUCHIYO
HYODO KENJI
HYODO KENJI
Application Number:
JP23550698A
Publication Date:
March 03, 2000
Filing Date:
August 21, 1998
Export Citation:
Assignee:
MITSUBISHI PAPER MILLS LTD
International Classes:
G03C8/06; G03F1/48; G03F1/56; H01L21/027; (IPC1-7): G03F1/14; G03C8/06; G03F1/08; H01L21/027
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