To provide a mask for complementary exposure which can realize overlap errors almost equivalent to the overlap errors, when complementary exposure techniques are not used, and a method for manufacturing the mask, and to provide an exposure method.

The mask has a set of a plurality of masks prepared by complementarily dividing a device pattern into a plurality of complementary division patterns and distributing the divided patterns. The mask has a first complementary mask 1, in which almost the wholly formed portions to be electrically connected to a base layer 21 are first division patterns 11, and a second complementary mask 2, in which almost the wholly formed of portions to be electrically connected to an upper layer 22 are as second division patterns 12.