Title:
MASK FOR PLASMA CVD, AND METHOD OF CLEANING MASK FOR PLASMA CVD
Document Type and Number:
Japanese Patent JP2007308763
Kind Code:
A
Abstract:
To provide a mask for plasma CVD (chemical vapor deposition) where, in a state of maintaining the advantages of a metallic mask, the service life of the mask can be elongated even if a plasma CVD system is used for the cleaning of the mask.
The mask 11 for plasma CVD is provided with: a metallic mask body 12 whose profile is rectangularly formed; and a ceramic cover 13 arranged on the periphery of the metallic mask body 12. The cover 13 is made of aluminum. The mask 11 for plasma CVD is cleaned using a plasma CVD system where a cleaning gas is fed from the side direction of the mask 11 for plasma CVD arranged inside a chamber into the chamber.
COPYRIGHT: (C)2008,JPO&INPIT
Inventors:
KIDOKORO ATSUSHI
HAYAKAWA KENJI
SUWA MASAO
HAYAKAWA KENJI
SUWA MASAO
Application Number:
JP2006139211A
Publication Date:
November 29, 2007
Filing Date:
May 18, 2006
Export Citation:
Assignee:
TOYOTA IND CORP
International Classes:
C23C16/04; H01L51/50; H05B33/04; H05B33/10
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda