Title:
MASK SUPPORT STRUCTURE AND ALIGNER USING IT
Document Type and Number:
Japanese Patent JP3648847
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To make it possible to correct the deflection caused by the own weight of a mask itself without increasing the thickness of the mask by a method wherein, on the outside of the support point of a support member which supports the mask from the lower side, the prescribed pressure is applied to the mask from above.
SOLUTION: This mask support structure is provided with a support member 11, which supports a mask 12 from the lower part, and a pressing means 50 with which the prescribed pressure is added to the mask 12 from above outside the support points 46a, 46b, 46c and 46d. The pressing means 50 can be constructed in such a manner that a weight stone 50 is placed on the outer edge of the mask. At this time, the weight and the arrangement of the weight stone 50 are set in such a manner that the deflection caused by the own weight of the mask 12 can be offset. Also, an active pressurizing means, with which the force given to the mask 12 can be controlled, may be used as the pressing means 50. In this case, it is desirable that the pressure of the active pressing means is controlled based on the value of measurement of the flatness of the mask 12.
Inventors:
Noriaki Tokuda
Application Number:
JP14858596A
Publication Date:
May 18, 2005
Filing Date:
May 20, 1996
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F1/60; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F1/14; G03F7/20
Domestic Patent References:
| JP5291112A | ||||
| JP6130344A | ||||
| JP3029313A | ||||
| JP8264410A | ||||
| JP63014429A | ||||
| JP7326566A |