PURPOSE: To prevent the long pitch precision from being deteriorated by the stress of X-ray shielding frame patterns by a method wherein, when the X-ray shielding frame patterns are provided with tensile force, an X-ray transmissive thin film below the bottom surface of said patterns is formed thinner than the film in an X-ray exposure region.

CONSTITUTION: A mask 1 for X-ray exposure is provided with X-ray absorbing patterns 3 on one surface side of X-ray transmissive thin film 2 as well as X-ray shielding frame patterns 6 with tensile force in the surface region of X-ray transmissive thin film 2 corresponding to the X-ray shielding region around the patterns 3. Besides, a holding frame 6 is provided on the other surface side of X-ray transmissive thin film 2. The X-ray transmissive thin film 2 in the regions corresponding to X-ray shielding frame patterns 6 is formed thinner than the film 2 in the region corresponding to the X-ray exposure region. Furthermore, the thickness of X-ray transmissive thin film 2 corresponding to the bottom surface of X-ray shielding frame patterns 6 is specified so that the composite force of tensile force of X-ray transmissive thin film 2 in the region corresponding to the bottom surface of X-ray shielding frame patterns 6 and the tensile force of X-ray shielding frame patterns 6 may be equivalent to the tensile force of X-ray transmissive thin film 2 in the region corresponding to the X-ray transmissive region.