PURPOSE: To form the antireflection film which does not dissolve in the solvent of a photoresist on the body to be etched and to prevent the formation of the intermixing layer between the antireflection film and the resist film by applying the acrylic skeletal polymer having a heat crosslinking group as the essential material of a nonvolatile component.
CONSTITUTION: For the material for antireflection film, the acrylic skeletal polymer A, B and C having a heat crosslinking group as the essential material of a nonvolatile component are used. The heat crosslinking group causes crosslinking reaction, and the combination of epoxy, glicydyl, carboxyl group and its acid chloride group can be applied. The material for antireflection film is composed of the solvent which dissolves the acrylic skeletal polymer having the heat crosslinking group and the pigment which absorbes the exposing light which exposes a photoresist. The material for antireflection film is applied on the material to be etched and heated to cause sufficient crosslinking of the crosslinking group, and the antireflection film which does not elute the photoresist into the solvent is formed.
HIROSE MINORU
TAKECHI SATOSHI
| JPS61180241A | 1986-08-12 |