Title:
リソグラフィー用下層膜形成用材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜、レジストパターン形成方法、及び回路パターン形成方法
Document Type and Number:
Japanese Patent JP6879201
Kind Code:
B2
Abstract:
The present invention provides a material for forming an underlayer film for lithography, including a cyanic acid ester compound obtained by cyanation of a modified naphthalene formaldehyde resin.
Inventors:
Kana Okada
Takashi Makinoshima
Echigo Masatoshi
Touhara Go
Atsushi Ogoshi
Takashi Makinoshima
Echigo Masatoshi
Touhara Go
Atsushi Ogoshi
Application Number:
JP2017503418A
Publication Date:
June 02, 2021
Filing Date:
February 19, 2016
Export Citation:
Assignee:
Mitsubishi Gas Chemical Co., Ltd.
International Classes:
G03F7/11; C08G14/12; G03F7/20; G03F7/26
Domestic Patent References:
| JP2006193607A | ||||
| JP2012212051A | ||||
| JP2010189470A |
Foreign References:
| US20140227887 | ||||
| WO2009072465A1 | ||||
| US20050182203 | ||||
| US20170226263 | ||||
| WO2014203865A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Kazuhiko Naito
Toshifumi Onuki
Kazuhiko Naito