Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MATERIAL FOR HOLDING ARTICLE TO BE POLISHED
Document Type and Number:
Japanese Patent JP2014042969
Kind Code:
A
Abstract:

To provide a material for holding an article to be polished, which has no buff streak on a surface and which improves surface waviness.

A material 1 for holding an article to be polished includes a foam layer 3 having tear-drop type air bubbles 2. While a surface close to an overgrown part of the tear-drop type air bubbles 2 serves as a holding surface for holding the article to be polished, an adhesive member 6 for being fixed to a surface plate is stuck on a surface close to a taper-shaped part of the tear-drop type air bubbles 2. The holding surface is formed by being separated from a smooth base material.


More Like This:
JPS58136258【考案の名称】研摩装置
JP2001198809POLISHING WORK HOLDING BOARD, POLISHING DEVICE AND WORK POLISHING METHOD
JP2010082700APPARATUS FOR MANUFACTURING GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM
Inventors:
TAMAGAWA TOMOHITO
KAWABATA KATSUMASA
HABA SHINICHI
YAMAMOTO KEIJI
OTO TAKESHI
Application Number:
JP2012187484A
Publication Date:
March 13, 2014
Filing Date:
August 28, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NITTA HAAS INC
International Classes:
B24B37/30; H01L21/304
Domestic Patent References:
JP2006326714A2006-12-07
JP2011005562A2011-01-13
JP2010125584A2010-06-10
JP2006326714A2006-12-07
JP2011005562A2011-01-13
JPH0623664A1994-02-01
Foreign References:
US4841680A1989-06-27
Attorney, Agent or Firm:
Kazuhide Okada



 
Previous Patent: MONITORING METHOD AND POLISHING DEVICE OF DRESSING PROCESS

Next Patent: PART PEELING DEVICE OF RESIN-COATED STEEL PIPE, AND METHOD FOR THE SAME