To measure both of a non-polarization aberration and a polarization aberration (retardation and azimuth of double refraction) being optical characteristics of a projection optical system in the state that the projection optical system is mounted on an exposure apparatus.
A measurement apparatus is equipped with: a first polarization control unit configured to control a polarization state of light which enters an optical system to be measured, to at least two different polarization states; a wavefront splitting unit which is inserted between the first polarization control unit and the optical system to be measured and an imaging sensor having an imaging plane, or between the optical system to be measured and the imaging sensor, in order to split a wave front of the light; a second polarization control unit which is inserted between the optical system to be measured and the imaging sensor, includes a phase plate rotatable about an optical axis, and is configured to control the polarization state of the light; a control unit configured to control a rotation of the phase plate so as to sequentially form a plurality of interference patterns on the imaging plane in response to each of at least two polarization states of the light; and a processing unit configured to calculate the optical characteristics of the optical system, based on the plurality of interference patterns photographed by the imaging sensor.
TAKEUCHI SEIJI
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
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