Title:
ＥＵＶマスク検査システムの光学系の波面収差計測
Document Type and Number:
Japanese Patent JP6312682
Kind Code:
B2
Abstract:
Disclosed is test structure for measuring wave-front aberration of an extreme ultraviolet (EUV) inspection system. The test structure includes a substrate formed from a material having substantially no reflectivity for EUV light and a multilayer (ML) stack portion, such as a pillar, formed on the substrate and comprising a plurality of alternating pairs of layers having different refractive indexes so as to reflect EUV light. The pairs have a count equal to or less than 15.
Inventors:
Jaan cheer
Liu Yan Wei
Cesar Abdulrahman (Apo)
Liu Yan Wei
Cesar Abdulrahman (Apo)
Application Number:
JP2015530007A
Publication Date:
April 18, 2018
Filing Date:
August 28, 2013
Export Citation:
Assignee:
KLA-Tenker Corporation
International Classes:
G03F1/24; G02B5/08; G02B19/00; G03F1/84; G03F7/20
Domestic Patent References:
| JP2010206033A | ||||
| JP2009071126A | ||||
| JP2004289116A | ||||
| JP2009141177A | ||||
| JP2012503318A | ||||
| JP2011103344A | ||||
| JP4348020A | ||||
| JP64004021A | ||||
| JP2010118520A | ||||
| JP2011176127A | ||||
| JP2011023592A | ||||
| JP2009158959A | ||||
| JP2011510480A |
Foreign References:
| WO2011157407A1 | ||||
| US5572564 | ||||
| US20090147364 | ||||
| WO2011157643A1 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office
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