To make high durability and low consumption property of a polishing body compatible with high polishing speed, facilitate its incorporation into a polishing device, and reduce efficiency of waste liquid treatment, influence on the environment, and facility when the polishing body is applied to a polishing process.

A silica body which is made of silica (silicon dioxide) mainly, has bulk density of 0.2 to 1.5 g/cm3, BET specific surface area of 10 to 400 m2/g, and average particle diameter of 0.001 to 0.5 μm, and has continuous minute pores as open pores is used as a basic material. A member for polishing having solid soluble in polishing liquid in the open pore of the silica body and a surface plate for polishing and a polishing method which employ the member for polishing are used.