膜脱気装置の洗浄方法及び超純水製造システム

Japanese Patent JP7236313

B2

Provided are a method for efficiently cleaning membrane degassing devices without removing the membrane degassing device from the system for producing ultrapure water, and a system for producing ultrapure water to which this cleaning method can be applied.　The method for cleaning a membrane degassing device 5 that is provided in a system for producing ultrapure water comprising a preprocessing means, a primary pure water producing unit, and a secondary pure water producing unit alternately performs a forward washing step of cleaning the membrane degassing device 5 by cleaning water flowing into the membrane degassing device 5 in the same direction that the water to be processed flows through the membrane degassing device 5 and a reverse washing step of cleaning the membrane degassing device 5 by the cleaning water flowing into the membrane degassing device 5 in the direction opposite to the direction that the water to be processed flows through the membrane degassing device 5. The system for manufacturing ultrapure water comprises the preprocessing means, the primary pure water producing unit, and the secondary pure water producing unit, and has the membrane degassing device 5 and a prescribed cleaning means in the primary pure water producing unit or the secondary pure water producing unit.

Masamitsu Iiyama
Hiroki Miyazawa

JP2019074911A

March 09, 2023

April 10, 2019

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Nomura Micro Science Co., Ltd.

B01D65/06; B01D19/00; B01D61/00; B01D61/44; B01D65/02; C02F1/44; C02F1/469

JP2001170630A
JP2005288336A
JP8266807A
JP7313845A
JP11057415A
JP2007090249A
JP2000126559A

WO2016117024A1

Patent Attorney Sakura International Patent Office

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