Title:
膜処理ユニット、基板処理装置および基板処理方法
Document Type and Number:
Japanese Patent JP6503279
Kind Code:
B2
Abstract:
A substrate is held and rotated by a spin chuck, and a coating liquid is discharged to the substrate. The coating liquid that is splashed outwardly from the substrate is received by an outer cup. A cleaning liquid that has been discharged from a cup cleaning nozzle is discharged to an inner peripheral surface of the outer cup through a first guide to clean the outer cup. Thus, the coating liquid, its solidified matter and the like adhering to the outer cup are dissolved and removed from the outer cup. Subsequently, a metal removal liquid that has been discharged from the cup cleaning nozzle is discharged to an inner peripheral surface of the outer cup through a second guide. Thus, a metallic component remaining on the outer cup is dissolved and removed from the outer cup.
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Inventors:
Yuji Tanaka
Masaya Asai
Masahiko Harumoto
Koji Kanayama
Masaya Asai
Masahiko Harumoto
Koji Kanayama
Application Number:
JP2015220496A
Publication Date:
April 17, 2019
Filing Date:
November 10, 2015
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304; H01L21/027
Domestic Patent References:
| JP5160017A | ||||
| JP2001319910A | ||||
| JP2009239081A | ||||
| JP2006332185A | ||||
| JP2013076973A | ||||
| JP6124887A |
Attorney, Agent or Firm:
Yoshito Fukushima
Sawamura Hideyuki
Sawamura Hideyuki