Title:
MEMS DEVICE AND MEMS DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2016072345
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To inhibit deterioration in gas adsorption capability in an adsorption layer and further inhibit a decrease in vacuum level of an internal space.SOLUTION: A MEMS device comprises: a substrate; an element part which is provided on the substrate and has a movable part; a joining part which is provided on the substrate to surround the element part; and a lid part whose substrate side surface is partially joined to the joining part to form an internal space including the element part. The lid part has a plurality of recesses on the substrate side surface at a portion opposite to the internal space and a film part on the substrate side surface at a portion including at least the plurality of recesses. The film part has an absorption layer which is provided on the lid part to absorb a gas in the internal space and a coating layer provided to coat the absorption layer.SELECTED DRAWING: Figure 1
Inventors:
IWAI HISASHI
Application Number:
JP2014198210A
Publication Date:
May 09, 2016
Filing Date:
September 29, 2014
Export Citation:
Assignee:
NIHON DEMPA KOGYO CO
International Classes:
H01L23/02; B81B3/00; B81C3/00; H01L29/84; H03H9/24
Attorney, Agent or Firm:
Tomihiko Isono
Kazuya Nishi
Kazuya Nishi
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