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Title:
MESH FOR PRECISE PRINTING AND METHOD FOR MANUFACTURING PATTERN INTEGRATED SCREEN MASK
Document Type and Number:
Japanese Patent JP2001334629
Kind Code:
A
Abstract:

To provide a method for manufacturing a pattern integrated screen mask capable of realizing a printing flat mesh screen mask obtained by integrating a nickel mesh with a pattern by using not a woven net but the nickel mesh as the mesh.

A primary resist (dry film or the like) is treated on a stainless steel base plate 1, and a mesh pattern is exposed thereon. A part corresponding to a fiber of the resist is melted and removed in a groove-like state, and an exposure part 3 is formed on the base plate. This exposure part is nickel-plated, a residual resist is melted and removed, and a nickel mesh pattern 6 is generated. This surface is copper-plated, the mesh is fixed, the base plate is released, and the exposed mesh surface of the released surface is treated with a secondary resist. A pattern corresponding to a printing object is superposed, exposed, the resist except the pattern part is melted and removed, the exposure part is nickel-plated, and the resist of the pattern and the copper-plating are melted and removed.


Inventors:
WATANABE EIJI
SAKAI SATORU
Application Number:
JP2000157660A
Publication Date:
December 04, 2001
Filing Date:
May 29, 2000
Export Citation:
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Assignee:
ODENSHA KK
International Classes:
B41C1/14; G03F1/00; G03F7/40; (IPC1-7): B41C1/14; G03F1/00; G03F7/40
Domestic Patent References:
JPH10228114A1998-08-25
JP2040037105A
JP2043100555A
Attorney, Agent or Firm:
Toshi Inoguchi