Title:
極端紫外線又は電子線リソグラフィー用金属含有膜形成組成物及びパターン形成方法
Document Type and Number:
Japanese Patent JP7205472
Kind Code:
B2
Abstract:
A metal-containing film-forming composition for lithography with an extreme ultraviolet ray or electron beam includes a compound and a solvent. The compound includes a metal element and an oxygen atom, and further includes a metal-oxygen covalent bond. The metal element in the compound belongs to period 3 to period 7 of group 3 to group 15 in periodic table. The solvent includes a first solvent component having a normal boiling point of less than 160° C. and a second solvent component having a normal boiling point of no less than 160° C. and less than 400° C. The solvent includes an alcohol solvent. A percentage content of the alcohol solvent in the solvent is no less than 30% by mass.
Inventors:
Ryuichi Serizawa
Nozomi Sato
Yusuke Otsubo
Nozomi Sato
Yusuke Otsubo
Application Number:
JP2019532575A
Publication Date:
January 17, 2023
Filing Date:
July 20, 2018
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/11; C07F7/00; C07F7/28; C07F19/00; C08G79/00; G03F7/20; H01L21/027
Domestic Patent References:
| JP2014167098A |
Attorney, Agent or Firm:
Yoshinori Ikeda
Amano Kazunori
Amano Kazunori
Previous Patent: Image processing device and image processing method
Next Patent: MUTIPLE NEEDLE RECORDING HEAD AND MANUFACTURE THEREOF
Next Patent: MUTIPLE NEEDLE RECORDING HEAD AND MANUFACTURE THEREOF