To provide a metallic pattern material capable of forming a metallic pattern of thin lines or small dots with high resolution after plating, and to provide a manufacturing method of the metallic pattern material.
The manufacturing method of a metallic pattern material comprises the steps of: exposing a specified light sensitive material for plating formation in exposure at a pitch of 6 μm or less with a laser power of 100% or less and [(pitch (μm)×75/6+25)-30]-[(pitch (μm)×75/6+25)+15]% to optimal power at the time of exposure at 6 μm pitch; developing the light sensitive material for plating formation after exposure with a developer; and plating the light sensitive material for plating formation with a pattern formed after development at a plating bath ratio of 10 or less.
KONO TAKATSUGU
Yoshihiro Nagare
Naoko Matsuda