Title:
傾斜角光格子をインプリントする方法
Document Type and Number:
Japanese Patent JP7242709
Kind Code:
B2
Abstract:
Embodiments described herein relate to methods of fabricating waveguide structures with gratings having front angles less than about 45° and back angles less than about 45°. The methods include imprinting stamps into nanoimprint resists disposed on substrates. The nanoimprint resists are subjected to a cure process. The stamps are released from the nanoimprint resist at a release angle ϑ using a release method. The nanoimprint resists are subjected to an anneal process to form a waveguide structure comprising a plurality of gratings with a front angle α and a back angle β relative to a second plane of the surface of the substrate less than about 45°.
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Inventors:
Yong, Michael Yutaku
Godet, Ludovik
Fisser, Robert Jan
McMillan, Wayne
Godet, Ludovik
Fisser, Robert Jan
McMillan, Wayne
Application Number:
JP2020565843A
Publication Date:
March 20, 2023
Filing Date:
April 24, 2019
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
| JP2003344683A | ||||
| JP2008068611A | ||||
| JP2009516225A | ||||
| JP2010085722A |
Foreign References:
| WO2010064535A1 |
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation