Title:
クロロ原子含有有機ケイ素化合物の製造方法
Document Type and Number:
Japanese Patent JP4288463
Kind Code:
B2
Abstract:
To provide a method for producing a chlorine atom-containing organosilicon compound by which a chlorosilane or a chlorosilane compound is industrially advantageously and inexpensively produced from a hydrosilane or a hydrosilane compound in good yield.
The method for producing the chlorosilane compound represented by general formula (2): R1R2R3SiCl (wherein, R1, R2and R3are each a 1-20C substituted or nonsubstituted monovalent hydrocarbon group, provided that all of the R1, R2and R3have ≥2 carbons respectively or at least one of the R1, R2and R3is a secondary or tertiary monovalent hydrocarbon) involves reacting the hydrosilane compound represented by general formula (1): R1R2R3SiH (wherein, R1, R2and R3are the same as the above) with hydrochloric acid in the presence of a catalyst containing a group 8-10 metal.
COPYRIGHT: (C)2004,JPO&NCIPI
Inventors:
Yasufumi Kubota
Toru Kubota
Application Number:
JP2002378871A
Publication Date:
July 01, 2009
Filing Date:
December 27, 2002
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
B01J23/46; B01J23/44; C07B61/00; C07F7/12
Domestic Patent References:
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
