Title:
感光性組成物、感光性金属錯体、塗布液、及び金属酸化物薄膜パターンの製造方法
Document Type and Number:
Japanese Patent JP5627195
Kind Code:
B2
Abstract:
To provide a photosensitive composition from which a metal oxide thin film pattern of high contrast in which a crack is hardly generated, is manufactured, and also to provide a photosensitive metal complex, a coating liquid, and a method for manufacturing the metal oxide thin film pattern.
The photosensitive composition is represented by a formula (1). At least one of R1to R4in the formula (1) is any one of formulae (2) to (5). R13in the formulae (2) to (4) is represented by a formula (6) or a formula (7). R1to R4in the formula (1) which are not any of the formulae (2) to (5) and R5to R8in the formulae (6) to (7) are respectively any one of the following (a1) to (a14). Y in the formula (5) is any one of the following (b1) to (b5). R9to R10in the formula (6) and R9to R12in the formula (7) are respectively any one of the following (c1) to (c15).
COPYRIGHT: (C)2011,JPO&INPIT
Inventors:
コルドニエ クリストファー
仲村 亮正
藤嶋 昭
Application Number:
JP2009108011A
Publication Date:
November 19, 2014
Filing Date:
April 27, 2009
International Classes:
C07C69/84; G03F7/004; C07F5/00; C07F7/22; C07F7/28; C08G79/14; G03F7/40; H01L21/027
Attorney, Agent or Firm:
Nagoya international patent business corporation
