Title:
Method for Producing Salt, Resist Composition and Resist Pattern
Document Type and Number:
Japanese Patent JP6327394
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt used for a resist composition capable of producing a resist pattern having good line edge roughness.SOLUTION: The salt is represented by formula (I-A) [Qand Qare each F or a perfluoroalkyl group; Lis a C1-20 divalent saturated hydrocarbon group; Yis a group represented by formula (Iy); R' is H, a C1-6 alkyl group which is substituted with F or unsubstituted, a hydroxy group, or a cyano group; X' is a single bond, -O-, *-CO-O-, or the like; Rand Rare each independently a substituted or unsubstituted C1-10 aliphatic hydrocarbon group, a substituted or unsubstituted C4-36 alicyclic hydrocarbon group, a substituted or unsubstituted C6-36 aromatic hydrocarbon group, or a substituted or unsubstituted C3-36 heterocyclic group; Lis a substituted or unsubstituted C1-36 divalent hydrocarbon group; and two of R, Rand Lmay together form a ring containing S].SELECTED DRAWING: None
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Inventors:
Hiroshi Sakamoto
Yuko Mukai
Koji Ichikawa
Yuko Mukai
Koji Ichikawa
Application Number:
JP2017164050A
Publication Date:
May 23, 2018
Filing Date:
August 29, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F246/00; C08F220/38; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP20122933A | ||||
| JP201272109A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto