To provide a method and an apparatus for correcting a defect in a pattern substrate capable of stably correcting the defect and a manufacturing method of a pattern substrate.

The defect correcting apparatus comprises: a film 5 provided oppositely to a substrate 6; a pulse laser light source 1 for emitting laser light to provide an opening in the film 5; a pressing unit 30 for applying a defect correcting solution on the defect portion of the substrate 6 via the opening and pressing it to the substrate 6 to squeeze the solution applied on the substrate 6 via the opening into the defect; and a squeegee 31 provided movably in the direction nearly parallel to the substrate 6 and provided above the opening for removing the solution.