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Title:
METHOD AND APPARATUS FOR DEPOSITING AMORPHOUS ITO FILM
Document Type and Number:
Japanese Patent JP2008179850
Kind Code:
A
Abstract:

To provide a method for depositing an amorphous ITO film by which occurrence of fine crystals is suppressed.

A substrate W is tightly fitted on a stage 3 by a clamp 4 during the film deposition of an amorphous ITO film M. In this state, a refrigerant G is circulated around the substrate stage 3 by a refrigerant circulating means 5 to cool the substrate W to the temperature below the room temperature of a vacuum chamber 2. Thus, it is possible to suppress the occurrence of fine crystals inside the amorphous ITO film M due to the temperature rising of the substrate W.


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Inventors:
YANO KENSAKU
Application Number:
JP2007013285A
Publication Date:
August 07, 2008
Filing Date:
January 24, 2007
Export Citation:
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Assignee:
TOSHIBA MATSUSHITA DISPLAY TEC
International Classes:
C23C14/34; G02F1/1343; H01B13/00
Attorney, Agent or Firm:
樺澤 襄
Satoshi Kabazawa
Tetsuya Yamada



 
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