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Patent Searching and Data


Title:
METHOD AND APPARATUS FOR INSPECTING PHOTO-MASK
Document Type and Number:
Japanese Patent JPS5974628
Kind Code:
A
Abstract:
PURPOSE:To inspect a photo-mask accurately by light beams by using each side of two pairs of octagons constituted by picture elements as measuring units and inspecting minimum conductor width and a minimum conductor space. CONSTITUTION:Each digit represents bits and picture element data memorized to a memory circuit, and the measuring units a1, a4, b1, b4, c1, c4, d1, d4 constituting the octagon on the outside are used for inspecting conductor width and the measuring units a2, a3, b2, b3, c2, c3, d2, d3 constituting the octagon on the inside for inspecting the conductor spaces. The state in which the picture elements of opposite sides have values corresponding to a non-conductor section by one picture element or more and all of the picture elements of sides opposite in the vertical directions of sides have values corresponding to a conductor section in the measuring units of the octagon on the outside or the picture elements of opposite sides have values corresponding to the conductor section by one picture element or more and all of the picture elements of sides opposite in the vertical directions of sides have values corresponding to the non-conductor in the measuring units of the octagon on the inside is detected.

Inventors:
OOE AKIHIKO
FUSE MASAKI
Application Number:
JP18519882A
Publication Date:
April 27, 1984
Filing Date:
October 21, 1982
Export Citation:
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Assignee:
MITSUBISHI RAYON CO
International Classes:
G01N21/88; G01N21/93; G01N21/956; G03F1/84; H01L21/027; H01L21/66; (IPC1-7): H01L21/30