PURPOSE: To simplify manufacture process and to improve and stabilize characteristic by floating ceramic dielectric micro-particles with specific diameters in a gas, and spraying and depositing aerosol processed ceramic dielectric micro- particles in high speed on a substrate through a nozzle to form a ceramic dielectric thick film layer.

CONSTITUTION: Ceramic dielectric micro-particles with diameters of 1μm or less are floated in a gas and aerosol processed, the aerosol processed ceramic dielectric micro-particles are sprayed at a high speed through a nozzle 6 on a substrate 2 and are deposited, thereafter, the deposited layer surface is heated by a heating beam to be sintered, and a ceramic dielectric thick film layer with a thickness of 1-20μm is formed. As the ceramic dielectric micro-particles with diameters of 1μm or less are used, the film can be formed densely. Therefore, a dielectric layer which should be formed can be made thin, the characteristics is stabilized, and manufacture process can be simplified.