To provide a method and apparatus for manufacturing a functional film, preventing the deterioration of flatness of a coating film which causes a defect such as crack/omission of an inorganic film when forming the inorganic film on the coating film with a vacuum film-forming apparatus.

A support B is continuously sent out of a film roll 40 in a coating film forming apparatus 20, a coating film is formed on the support B and the support B is taken up to a film roll 42 under less pressure than atmospheric pressure. The film roll 42 is then loaded into the vacuum film-forming device 22, the support B is continuously sent out of the film roll 42, an inorganic film is formed on the coating film and the support B is taken up to a film roll 48.