Title:
METHOD AND APPARATUS FOR REMOVING RESIDUAL OF CHLORINATED SOLVENT FORMED DURING DRYING STAGE FROM CONTACT WATER IN DRY CLEANING MACHINE OF CLOTHES
Document Type and Number:
Japanese Patent JP2572189
Kind Code:
B2
Abstract:
PURPOSE: To provide a method and an apparatus for removing from contact water of residual of a chlorinated solvent resulting from the drying stage in a dry cleaning machine of clothes and solving an environmental problem caused by the abandonment of the contact water.
CONSTITUTION: The contact water containing chlorinated solvent residual after decantation is evaporated, the vapor is irradiated with ultraviolet radiation, the chlorine-carbon bond of the solvent is destroyed and it is turned to a state harmless to environmental pollution and discharged into the atmosphere. This device for that is provided with an evaporation chamber 7, a means 9 for evaporating the contact water and the solvent residual and an ultraviolet ray lamp 12 arranged inside a housing 11 on the outside of a chamber communicated with the evaporation chamber through a window 10 closed by a quartz glass plate.
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Inventors:
GABURIO RENZATSUSHI
Application Number:
JP27906192A
Publication Date:
January 16, 1997
Filing Date:
October 19, 1992
Export Citation:
Assignee:
RENZATSUSHI SPA IND RABATORISHI
International Classes:
B01D1/00; C02F1/04; C02F1/32; C02F1/58; D06F43/08; (IPC1-7): D06F43/08; B01D1/00; C02F1/32; C02F1/58
Domestic Patent References:
| JP2122683B | ||||
| JPH01218676A | ||||
| JPH04164499A | ||||
| JPH03151023A | ||||
| JPS6329517U |
Attorney, Agent or Firm:
Akira Asamura (3 outside)