Title:
METHOD AND APPARATUS FOR
Document Type and Number:
Japanese Patent JPH02166732
Kind Code:
A
Abstract:
PURPOSE: To minimize damage at low pressure or to execute optimum etching by providing the step of monitoring a peak-to-peak voltage and the step of maintaining the gas pressure in a chamber at a value nearly corresponding to a minimum peak-to-peak voltage. CONSTITUTION: Glow discharge is caused in a chamber 20 and at least one kind of gas is supplied into the chamber 20 from a mixing chamber 21. The chamber 21 is supplied with gas from a supply source 22 by a mass and flow rate controller 23 and from a supply source 24 by a mass and flow rate controller 25. The chamber 20 is evacuated through a gate valve 27 and a vacuum pump 28. The pressure in the chamber is desirably monitored by a pressure sensor 31 consisting of a capacitive manometer. A peak-to-peak sensor 33 is connected to an RF generator 26 to supply the output representing a peak-to- peak voltage to a controlling logic 32. At the time of automatic operation, the logic 32 is used for controlling the evacuation of the chamber 20 by operating the valve 27.
Inventors:
OORE KUROFU
Application Number:
JP28510089A
Publication Date:
June 27, 1990
Filing Date:
November 02, 1989
Export Citation:
Assignee:
TEGAL CORP
International Classes:
H05H1/46; H01J37/00; H01J37/32; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; H01L21/3213; (IPC1-7): H01J37/00; H01L21/205; H01L21/302; H01L21/31; H01L21/3205; H05H1/46
Attorney, Agent or Firm:
Yoshikazu Tani (1 person outside)