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Patent Searching and Data


Title:
METHOD FOR CHECKING DISCHARGE-QUANTITY OF RESIST AND APPARATUS FOR RESIST COATING
Document Type and Number:
Japanese Patent JP2000084468
Kind Code:
A
Abstract:

To improve the accuracy and the reproducibility of the thickness of a resist coated film by measuring the weight-change of a coated resist with the passage of time by using a measuring device which measures the weight of a wafer placed on a chuck continuously.

A discharge-quantity of a resist 8 on a wafer 9 is determined by increasing weight of a chuck 10 from the beginning of discharging to the end, namely, the increasing weight is input to a comparing-determining circuit 6 in which the difference between the increasing weight and the set weight is compared and processed, and then the discharge-quantity of the resist on the wafer 9 to be next treated are not changed when dripped quantities of the resist 8 are within 5% or less ± a standard value, and when they are above 5%, a correcting value is computed by a operating circuit 5 and a correcting value is directed to a discharge-quantity regulator 4, and an action is taken on a discharge pump 3 of the resist so that the discharge-quantity on the wafer 9 to be next treated is adjusted.


Inventors:
WADA KOICHI
Application Number:
JP26213298A
Publication Date:
March 28, 2000
Filing Date:
September 16, 1998
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
B05C11/10; G03F7/16; H01L21/027; (IPC1-7): B05C11/10; G03F7/16; H01L21/027
Attorney, Agent or Firm:
Kisaburo Suzuki (2 outside)