Title:
METHOD FOR CORRECTING DEFECTIVE MASK
Document Type and Number:
Japanese Patent JPH06332153
Kind Code:
A
Abstract:
PURPOSE: To provide a method for correcting a defective mask by which the size of a defect correction part and the arrangement of the defect correction part are optimized and the defect correction part is positioned by giving some margin.
CONSTITUTION: A defect correction area 48 provided with a rectangular plane pattern is formed and distances (W1 and L) between faced correction edges 50 are set to be ≥1μm being such a distance that mutual light interference can be ignored. Besides, the shortest distance between the edges 50 and the edge 46 of the pattern is set to be ≥1μm.
Inventors:
OTSUKA HIROSHI
KUWABARA KAZUYUKI
ONODERA TOSHIO
KUWABARA KAZUYUKI
ONODERA TOSHIO
Application Number:
JP12103393A
Publication Date:
December 02, 1994
Filing Date:
May 24, 1993
Export Citation:
Assignee:
OKI ELECTRIC IND CO LTD
International Classes:
G03F1/72; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Takashi Ogaki